In the realm of micro and nano-device technology, the quest for intricate, high-resolution structures has led researchers to explore innovative lithography techniques. Among these, grayscale lithography stands out for its ability to create three-dimensional architectures with tunable depth profiles, a feat that conventional binary lithography struggles to achieve. However, the vertical resolution of existing grayscale lithography techniques, while impressive, still falls short of the sub-nanometer scale, a limitation that has hindered the exploration of unique properties at this scale. This is where the groundbreaking development of probe-guided laser direct writing (PG-LDW) comes into play, offering a solution that promises to (Read more…)
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